In situ probe measurements of plasma parameters during the deposition of boron coatings by the magnetron method

The features of the probe technique are described and results measuring parameters plasma generated by a planar magnetron sputtering system with pure boron target during coating deposition presented. A feature measurements was use heating collecting surface single Langmuir probe. Heating led to decrease in electrical resistance film on surface, which made it possible carry out situ discharge entire process coating. Keywords: parameters, method, magnetron, films.